NBS 1963A Resolution Target-NBS 1963A Resolution Target-Ningbo Zhixing Optical Technology Co., Ltd.

NBS 1963A Resolution Target

Product Series：NBS 1963A Resolution Target

Comprehensive Material & Specification Selection Library ：

Diverse substrates, extensive size/thickness coverage, and customizable coatings.

Sub-100 nm Position Accuracy (Position Accuracy < 100 nm) ：

Tailored for high-end semiconductor inspection and precision metrology, Zhixing Optics pushes the boundaries of physical fabrication. Leveraging a laser direct writing system with 3-sigma < 50 nm, we strictly control the relative positional error between feature points to within 100 nm.

Ultra-High Resolution Fabrication Capability (Feature Size < 500 nm) ：

Capable of fabricating minimum feature sizes below 500 nm with exceptionally smooth pattern edges. This ensures that feature edges remain crisp and burr-free even under high-magnification objectives or high-pixel sensors, significantly enhancing the stability and accuracy of centroid localization algorithms.

Closed-Loop Comprehensive Solution Support ：

Expert-level selection guidance Full-chain engineering implementation High-precision fixture support Full-parameter performance verification

Material Overview
customization capability
Product Specifications
Usage

Material Overview	K9 Glass	B270 Glass	Fused Silica	Soda-Lime Glass
Advantages	• High surface flatness and excellent surface figure accuracy • >90% light transmittance; suitable for transmission calibration • Sharp and smooth pattern edges; easily achieves micron and sub-micron precision • Clear imaging	• High surface flatness and excellent surface figure accuracy • >90% light transmittance; suitable for transmission calibration • Sharp and smooth pattern edges; easily achieves micron and sub-micron precision • Clear imaging	• High surface flatness and excellent surface figure accuracy • >90% light transmittance; suitable for transmission calibration • Sharp and smooth pattern edges; easily achieves micron and sub-micron precision • Clear imaging • Extremely low sensitivity to temperature and humidity variations	• High surface flatness and excellent surface figure accuracy • >90% light transmittance; suitable for transmission calibration • Sharp and smooth pattern edges; easily achieves micron and sub-micron precision • Clear imaging
Disadvantages	• Standard optical glass is brittle; prone to edge chipping and fracture upon impact • Front illumination causes glare/reflections	• Standard optical glass is brittle; prone to edge chipping and fracture upon impact • Front illumination causes glare/reflections	• Standard optical glass is brittle; prone to edge chipping and fracture upon impact • Front illumination causes glare/reflections	• Standard optical glass is brittle; prone to edge chipping and fracture upon impact • Front illumination causes glare/reflections
Surface Process	Chrome Plating	Chrome Plating	Chrome Plating	Chrome Plating
Substrate Thickness	2.3 mm (Tolerance: ±0.1 mm) 3 mm / 4.8 mm (Tolerance: ±0.2 mm) 7.8mm	2.3 mm (Tolerance: ±0.1 mm) 3 mm / 4.8 mm (Tolerance: ±0.2 mm) 7.8mm	2.3 mm (Tolerance: ±0.1 mm) 3 mm / 4.8 mm (Tolerance: ±0.2 mm) 7.8mm	2.3 mm (Tolerance: ±0.1 mm) 3 mm / 4.8 mm (Tolerance: ±0.2 mm) 7.8mm
Surface Roughness (Ra)	≤0.05 μm (Mirror Grade)	≤0.05 μm (Mirror Grade)	≤0.05 μm (Mirror Grade)	≤0.05 μm (Mirror Grade)
Visible Light Transmittance	85%–95% (Transparent)	85%–95% (Transparent)	85%–95% (Transparent)	85%–95% (Transparent)
Coefficient of Thermal Expansion (CTE)	K9:7.1 × 10⁻⁶/℃	B270：9.4 × 10⁻⁶/℃	Fused Silica: 5.0–5.5 × 10⁻⁷/℃	Soda-Lime: 8.5–9.5 × 10⁻⁶/℃
Applicable Wavelength Range	UV Region: Only transmits near-UV (>350 nm); virtually opaque to deep UV (<300 nm). IR Region: IR cutoff at 2100–2200 nm; transmittance drops rapidly beyond this range. Visible Region (400–760 nm): Good transmittance.	UV Region Only transmits long-wave near-UV (>330 nm); virtually opaque below 300 nm. UV cutoff shifts toward longer wavelengths as thickness increases. Not suitable for UVB or deep-UV detection. IR Region: IR cutoff ~3050 nm. High and stable transmittance in the 780–2500 nm NIR band; gradual attenuation above 2500 nm. Visible Region (400–760 nm) Low-iron composition eliminates greenish tint; average visible transmittance 91%–92%.	UV Region: Transmits deep UV (down to 185 nm); ideal for UV light sources, lithography, and UV inspection. IR Region: Furthest IR cutoff (~3500 nm); higher and more stable NIR transmittance. Visible Region (400–760 nm): Slightly higher transmittance and lower dispersion.	UV Region: Earliest UV cutoff (~360 nm); essentially unsuitable for UV applications. IR Region: IR cutoff at 2100–2200 nm; transmittance drops rapidly beyond this range. Visible Region (400–760 nm): Good transmittance.
Hardness & Scratch Resistance	Mohs 5.5–6; Prone to scratching	Mohs 5.5–6; Prone to scratching	Mohs 5.5–6; Prone to scratching	Mohs 5.5–6; Prone to scratching
Optical Path Compatibility	Transmission + Reflection	Transmission + Reflection	Transmission + Reflection	Transmission + Reflection
Typical Applications	High-precision lab calibration, microscopic vision, transmission calibration	High-precision lab calibration, microscopic vision, transmission calibration	High-precision lab calibration, microscopic vision, transmission calibration	High-precision lab calibration, microscopic vision, transmission calibration

NBS-1963A Resolution Test Target

I. Product Description

The NBS 1963A resolution test target is manufactured by depositing a low-reflectance chrome film onto a glass substrate. Each group of patterns in the target consists of five horizontal lines and five vertical lines, labeled with line frequencies indicated by group numbers. There are 26 groups in total, corresponding to line widths ranging from 1.0 µm to 55.6 µm. We offer both positive and negative versions of the NBS 1963A resolution test target:

Positive Target: Chrome patterns are deposited directly on the substrate, making it suitable for front-lit and general-purpose applications.

Negative Target: Chrome is deposited on the substrate such that the pattern areas transmit light, making it suitable for back-lit and high-intensity illumination applications.

II. Instructions for Use

The resolving power of an optical imaging system refers to its ability to distinguish two closely spaced points or fine details of an object. It is typically expressed in terms of line pairs per millimeter (cycles/mm), which quantifies the resolution of the system. A line pair consists of one black line and one white line. The greater the number of line pairs per millimeter that the system can resolve, the better its resolving power and the higher its resolution. As illustrated in Figure 1, which shows the maximum resolution of an optical imaging system, the upper set of line pairs has smaller line widths and spacings that the system cannot resolve; the lower set has larger line widths and spacings that the system can just barely resolve. The number of line pairs per millimeter corresponding to this latter set represents the maximum resolution of the imaging system.

(Figure 1)

The NBS 1963A resolution test target features groups of five horizontal and five vertical lines. Figure 2 shows a microscopic image of a portion of the line pairs on the NBS 1963A target. The target uses sets of five lines, where each individual line together with its adjacent spacing constitutes one line pair or one cycle (as indicated by "D" in Figure 2). The resolvable resolution of each test target is specified in frequency units of cycles/mm. On the NBS 1963A target, each line group is clearly labeled with its corresponding frequency. By identifying the smallest resolvable lines (i.e., the highest cycles/mm value), the resolution of the imaging system can be determined.

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